濕法腐蝕技術(shù)——2019神燈獎(jiǎng)申報(bào)技術(shù)

項(xiàng)目名稱：  濕法腐蝕技術(shù)

Wet Etching Technology

申報(bào)單位：  山東元旭光電股份有限公司

綜合介紹或申報(bào)理由：

1、濕法腐蝕技術(shù)用于藍(lán)寶石襯底刻蝕，得到的WPSS襯底能夠用于LED發(fā)光芯片的制作，并且較常規(guī)干法工藝得到的產(chǎn)品電壓低，良率和穩(wěn)定性高。

2、WPSS相對(duì)常規(guī)PSS性價(jià)比高

1、Wet etching technology is used for sapphire substrate etching. The obtained WPSS substrate can be used in the fabrication of LED chip, and the voltage is lower, the yield and stability are higher than those obtained by conventional dry process. 

2、 Compared with conventional PSS, WPSS has a higher performance-price ratio.

主要技術(shù)參數(shù)：

下圖
   

與國(guó)內(nèi)外同類產(chǎn)品或同類技術(shù)的比較情況：

圖形化藍(lán)寶石襯底（PSS）有利于GaN外延層的應(yīng)力弛豫，且能抑制外延生長(zhǎng)過(guò)程中向上延升的位錯(cuò)密度，從而提高器件的內(nèi)量子效率，同時(shí)圖形化襯底能使原本在臨界角范圍外的光線通過(guò)圖形的反射重新進(jìn)入臨界角內(nèi)，從而提高發(fā)光效率。 投資低，效率高，產(chǎn)品均勻性好；生產(chǎn)使用的酸經(jīng)中和后，無(wú)危廢產(chǎn)生。目前我們是唯一一家生產(chǎn)WPSS 的廠家。

The graphical sapphire substrate (PSS) is beneficial to the stress relaxation of the GaN epitaxial layer, and can inhibit the upward rise of dislocation density during the epitaxial growth process, thus improving the internal quantum efficiency of the device. At the same time, the graphic substrate can make the light outside the critical angle reenter into the critical angle through the reflection of the pattern, so as to improve the luminous efficiency. Low investment, high efficiency, good uniformity of products, production and use of acid neutralization, no waste. At present, we are the only manufacturer of WPSS.

經(jīng)濟(jì)評(píng)價(jià)分析：

產(chǎn)品性價(jià)比高，制作過(guò)程無(wú)污染，應(yīng)用到芯片后得到的發(fā)光芯片電壓低，產(chǎn)品質(zhì)量更穩(wěn)定。

The product has the advantages of high cost performance, no pollution during the manufacturing process, low voltage of the light-emitting chip obtained after application to the chip, and more stable product quality.

技術(shù)及工藝創(chuàng)新要點(diǎn)：

通過(guò)高溫酸腐蝕的工藝得到的PSS，片內(nèi)均勻性，批次一致性，光型一致性，外延生長(zhǎng)匹配等均提高

The PSS, on-chip uniformity, batch consistency, light-type consistency, epitaxial growth matching, and the like obtained by the process of high-temperature acid etching are all improved

實(shí)際運(yùn)用案例和用戶評(píng)價(jià)意見(jiàn)：

公司因濕法襯底穩(wěn)定性高被乾照光電評(píng)委優(yōu)秀供應(yīng)商，2015-2018年新廣聯(lián)全部使用我司濕法襯底，并給予產(chǎn)品先進(jìn)性評(píng)價(jià)。詳見(jiàn)附件
   

獲獎(jiǎng)、專利情況：

我公司獲得2015年中國(guó)第四屆創(chuàng)新創(chuàng)業(yè)大賽優(yōu)秀獎(jiǎng)，2016年被評(píng)為高新技術(shù)企業(yè)，并且獲得相關(guān)發(fā)明專利。詳見(jiàn)附圖
   

申報(bào)單位介紹：

元旭光電定位于納微米尺寸產(chǎn)品研發(fā)、制造，通過(guò)LED用圖形藍(lán)寶石襯底（PSS）快速切入市場(chǎng)，并將產(chǎn)品線逐步拓展到Micro-LED芯片、醫(yī)療美容微針、經(jīng)皮給藥芯片等應(yīng)用市場(chǎng)，逐步打造成為以創(chuàng)新技術(shù)為支撐的微納米光電子及生物醫(yī)療產(chǎn)品提供商。

Novoshine located in nano-micron size products research and development, manufacturing, through LED graphics sapphire substrate (PSS) fast cut into the market, and gradually expand the product line to Micro-LED chip, medical beauty micro-needle, transdermal drug delivery chip and other application markets, Gradually build with innovative technology as the support of micro-nano optoelectronics and bio-medical products provider.

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